Nano-Imprint Lithography (NIL)  Current interest in organic electronics is due to the compatibility of organic material with a variety of substrates and the potential ease of processing. A major hurdle for low cost manufacturing is the fabrication of high quality robust devices on flexible substrates. NanoImprint lithography (NIL) is a new method for patterning at the nanoscale. The basic concept of nano-imprint lithography (NIL) can be adapted to transfer all components needed to create a thin film transistor (TFT) on a plastic substrate. NIL involves pressing and heating a thin film between a patterned template and a substrate. Upon separation, the patterned film adheres only to the substrate. This technique inherently has high throughput and is relatively inexpensive compared to developing extreme deep uv lithography for commercial viability. NIL is also flexible enough to be used at chip level with several layers or at the wafer level when single layer is required. We have one of the first commercial tools developed by Nanonex (NX2000). Presently, we are working with the vendor to develop an aligner to enable fabrication of multilayer structures. |